JPH0235451B2 - - Google Patents
Info
- Publication number
- JPH0235451B2 JPH0235451B2 JP57018667A JP1866782A JPH0235451B2 JP H0235451 B2 JPH0235451 B2 JP H0235451B2 JP 57018667 A JP57018667 A JP 57018667A JP 1866782 A JP1866782 A JP 1866782A JP H0235451 B2 JPH0235451 B2 JP H0235451B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- irradiation
- start position
- deflector
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1866782A JPS58135629A (ja) | 1982-02-08 | 1982-02-08 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1866782A JPS58135629A (ja) | 1982-02-08 | 1982-02-08 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58135629A JPS58135629A (ja) | 1983-08-12 |
JPH0235451B2 true JPH0235451B2 (en]) | 1990-08-10 |
Family
ID=11977955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1866782A Granted JPS58135629A (ja) | 1982-02-08 | 1982-02-08 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58135629A (en]) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61234034A (ja) * | 1985-04-10 | 1986-10-18 | Agency Of Ind Science & Technol | 半導体単結晶層の製造方法 |
JPH0242717A (ja) * | 1988-08-03 | 1990-02-13 | Hitachi Ltd | エネルギービーム照射方法 |
US5322589A (en) * | 1989-02-09 | 1994-06-21 | Fujitsu Limited | Process and apparatus for recrystallization of semiconductor layer |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150238A (en) * | 1979-05-10 | 1980-11-22 | Matsushita Electric Ind Co Ltd | Method of irradiating laser beam |
-
1982
- 1982-02-08 JP JP1866782A patent/JPS58135629A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58135629A (ja) | 1983-08-12 |
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